Dow Electronic Materials vapor deposited zinc selenide,CVD ZINC
SELENIDE Material, is the material of choice for optical components in
high-powered CO2 lasers due to its low bulk absorption at 10.6 microns. Its
index of refraction homogeneity and uniformity offer excellent optical
performance for use as protective windows or optical elements in
high-resolution forward looking infrared (FLIR) thermal imaging equipment. This
material has also been used as small windows and lenses in medical and
industrial applications, such as thermometry and spectroscopy.
Dow Electronic Materials CVD ZINC SELENIDE Material is chemically inert, non-hygroscopic, highly pure, theoretically dense and easily machined. It has extremely low bulk losses due to absorption and scatter, has a high resistance to thermal shock and is stable in virtually all environments.
Circular blanks and sheet material are available in stock to meet your most urgent delivery requirements. Custom diameters,rectangles, CNC-profiled blanks, generated lens blanks, prisms, and near-net shape domes can also be made to your specifications. Dow Electronic Materials' CVD ZINC SELENIDE Material is also available as an evaporative source material. It is supplied in specified lump sizes (2–20 mm), which are hand selected to minimize surface contamination and to be free from saw cut, abraded or polished edges
HPFS® 8655 fused silica is an extremely pure synthetic glass with very low water content which leads to an exceptionally stable and predictable dynamic behavior under deep ultraviolet (DUV) laser exposures. It is a compaction only material, showing no expansion, with a much greater resistance versus the well-known standard compaction curve resulting in the lowest possible induced wavefront distortion.Glass Code 8655 is commonly utilized to manufacture optical lenses for use in state-of-the-art microlithography due to its minimized induced absorption and low polarization birefringence behaviors. In addition to its performance under DUV laser exposures, HPFS® 8655 fused silica meets microlithography’s lowest static birefringence, absorption and uniform refractive index homogeneity specifications.